
| I-Tantalum Pentoxide | |
| Amagama afanayo: | I-Tantalum(V) oxide, i-Ditantalum pentoxide |
| Inombolo ye-CAS | 1314-61-0 |
| Ifomula yamakhemikhali | I-Ta2O5 |
| Isisindo se-molar | 441.893 g/mol |
| Ukubukeka | impuphu emhlophe, engenaphunga |
| Ubuningi | i-β-Ta2O5 = 8.18 g/cm3, i-α-Ta2O5 = 8.37 g/cm3 |
| Indawo yokuncibilika | 1,872 °C (3,402 °F; 2,145 K) |
| Ukuncibilika emanzini | okunganakwa |
| Ukuncibilika | inganyibiliki ezinyibilikisini eziphilayo kanye nama-asidi amaningi amaminerali, isabela ne-HF |
| Igebe lebhendi | 3.8–5.3 eV |
| Ukuzwela kumagnetic (χ) | −32.0×10−6 cm3/mol |
| Inkomba yokubukeza (nD) | 2.275 |
Ukucaciswa Kwamakhemikhali e-Tantalum Pentoxide Okuhlanzekile Okuphezulu
| Uphawu | I-Ta2O5(%min) | Umata Wangaphandle. ≤ppm | I-LOI | Usayizi | ||||||||||||||||
| Nb | Fe | Si | Ti | Ni | Cr | Al | Mn | Cu | W | Mo | Pb | Sn | U-Al+Ka+Li | K | Na | F | ||||
| I-UMTO4N | 99.99 | 30 | 5 | 10 | 3 | 3 | 3 | 5 | 3 | 3 | 5 | 5 | 3 | 3 | - | 2 | 2 | 50 | 0.20% | 0.5-2µm |
| I-UMTO3N | 99.9 | 3 | 4 | 4 | 1 | 4 | 1 | 2 | 10 | 4 | 3 | 3 | 2 | 2 | 5 | - | - | 50 | 0.20% | 0.5-2µm |
Ukupakisha: Kumadramu ensimbi anepulasitiki ephindwe kabili evalwe ngaphakathi.
I-Tantalum Oxides kanye ne-Tantalum Pentoxides zisetshenziselwani?
Izindawo zokusetshenziswa eziyinhloko
1. Izinto zokusebenza ze-elekthronikhi
1. I-Substrate Yesihlungi Se-Surface Acoustic Wave (SAW):
- Izinto eziyinhloko zokwenziwa kwamakristalu angawodwa e-lithium tantalate (LiTaO₃), asetshenziselwa ukukhiqiza izihlungi zemvamisa yomsakazo zamadivayisi okuxhumana eselula.
- Izinhlelo zokusebenza ze-terminal: ama-smartphone/amaphilisi (ukusekelwa kwebhendi ye-5G), amamojula e-GPS, amamitha ahlakaniphile e-IoT
- Inzuzo yokusebenza: ukuzinza kwemvamisa ± 0.5ppm (-40℃ kuya ku-+85℃)
2. Izibikezeli ze-semiconductor:
- Izinto zokwenziwa ze-Tantalum carbide (TaC): zokugqoka amathuluzi aqinile kakhulu (ubulukhuni obuncane ≥ 2200 HV)
- Ithagethi yokuphalaza: Ukufakwa kwesendlalelo se-dielectric capacitor ye-DRAM (i-dielectric constant εr = 25-30)
2. Ubuchwepheshe Bokubona
1. Uhlelo lwe-optical olusezingeni eliphezulu:
- Isithuthukisi senkomba yokubuka: Khulisa inkomba yokubuka yengilazi yokukhanya ibe yi-nd=1.75-2.20 (400-700nm)
- Ukugqoka okumunca kancane: Ukulungiswa kwefilimu elwa nokukhanya (i-extinction coefficient k<0.001@550nm)
2. Izicelo ezikhethekile zefayibha:
- Ama-dopants e-Fiber Bragg Grating: Thuthukisa ukuzwela kwezinga lokushisa kufinyelele ku-15pm/°C
- Izingxenye ze-infrared optical: Ukudluliselwa kwe-transmittance ku-3-5μm mid-infrared band > 92%
3. Ukuthuthukiswa Nokuguqulwa Kwezimboni
1. I-Catalysis Yamakhemikhali:
- I-Olefin epoxidation catalyst: izinga lokuguqulwa > 95% (i-reactor yombhede oqinile)
- I-Photocatalyst yokukhiqizwa kwe-hydrogen emanzini (okuhlanganisiwe ne-CdS)
2. Ukuguqulwa kwezinto:
- Izithasiselo ze-alloy ezimelana nokugqwala: Thuthukisa ukumelana kwe-oxidation kwe-alloys ezisekelwe ku-nickel ku-1100°C
- Isigaba sokuqinisa i-ceramic: Ukuqina kokuqhekeka kwezinhlanganisela ezisekelwe ku-alumina kukhuphuke ngo-40%
| impahla | Ububanzi bepharamitha | Izindinganiso zokuhlola |
| Ibanga lokuhlanzeka | Ibanga le-elekthronikhi: 99.95% -99.999% | I-ICP-MS GB/T 26008 |
| Isakhiwo sekristalu | Isigaba se-Orthorhombic/isigaba esingaguquki (ongakukhetha) | I-XRD ISO 20203 |
| Ukusatshalaliswa kosayizi wezinhlayiya | D50: 0.5-10μm (i-nanoscale ingenziwa ngokwezifiso) | I-SEM ISO 13322-1 |
| Izakhiwo ze-dielectric | Amandla ensimu yokuqhekeka> 600kV/cm | I-IEC 60270 |
| Ukuqina kokushisa | Indawo yokuncibilika: 1872℃±10℃ | I-DSC ISO 1135 7 |
Ukuphepha Nokuthobela Imithetho
Ukuhlukaniswa Kwezokuthutha: AKUYONA INGOZI (inombolo ye-UN ayisebenzi)
Izidingo zokugcina: indawo eyomile ekamelweni lokushisa, gwema ukuthintana ne-asidi enamandla
Isitifiketi semvelo:
- Ihambisana ne-RoHS 3.0 Directive (2015/863/EU)
- Izinto ezingafakwanga ohlwini ngaphansi kwe-REACH SVHC
- Ukuhambisana neNqubomgomo Yezimbiwa Ezingqubuzanayo (CMRT 6.0)
Ikhwalithi yokulawula
1. Amazinga Ebanga:
- Ibanga lokubona: Ibanga lokufiphaza le-ISO 10110-7 A
- Izinga le-elekthronikhi: Ukulawulwa kokungcola kwensimbi kwe-SEMI C8.1
2. Isiqinisekiso sokuhlola:
- Nikeza umbiko wokuhlaziywa kwesisekelo se-XRF weqembu ngalinye
- Ukutholwa kwendawo engaphezulu ye-BET (okulungisekayo okungu-0.5-10m²/g)
- Ukuhlolwa kwe-Radionuclide (U/Th < 1 ppb)
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Amacala okusetshenziswa ajwayelekile
- Umkhiqizi wesihlungi sesiteshi se-5G usebenzisa i-Ta₂O₅ yezinga le-elekthronikhi, okunciphisa ukulahlekelwa kokufakwa kube yi-1.2dB (ibhendi ye-3.5GHz)
- High-end camera lens manufacturers use optical-grade products to achieve a refractive index of nd=2.15@587.6nm
Izinto okufanele uziqaphele
• Ukuphathwa kwempuphu ye-nano kumele kuhambisane nezindinganiso zokuvikela ukuphefumula ze-ISO 13137
• Kunconywa izitsha zokubhaka ze-Corundum ukuze kusetshenziswe ukushisa okuphezulu
• Izimbozo ezibonakalayo zidinga ukulawula izinga lokufakwa kwe-deposit libe ngaphansi kuka-0.5nm/s
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Le ncazelo isekelwe ezicini ezijwayelekile ze-tantalum pentoxide. Amapharamitha athile angaphansi kwe-COA (umbiko wokuhlolwa kwekhwalithi).
Izixazululo zobuchwepheshe ezenziwe ngokwezifiso zinganikezwa amafomu akhethekile (ama-nanopowders/ama-sputtering target/ama-single crystal substrates).