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Nano Boron Powder/Crystal Boron Powder

Short Description:

Boron, a chemical element with the symbol B and atomic number 5, is a black/brown hard solid amorphous powder. It is highly reactive and soluble in concentrated nitric and sulfuric acids but insoluble in water, alcohol and ether. It has a high neutro absorption capacity.
UrbanMines specializes in producing high purity Boron Powder with the smallest possible average grain sizes. Our standard powder particle sizes average in the range of – 300 mesh, 1 microns and 50~80nm. We can also provide many materials in the nanoscale range. Other shapes are available by request.


Product Detail

Boron
Appearance Black-brown
Phase at STP Solid
Melting point 2349 K ​(2076 °C, ​3769 °F)
Boiling point 4200 K ​(3927 °C, ​7101 °F)
Density when liquid (at m.p.) 2.08 g/cm3
Heat of fusion 50.2 kJ/mol
Heat of vaporization 508 kJ/mol
Molar heat capacity 11.087 J/(mol·K)

Enterprise Specification for Boron Powder

Product Name Chemical Component Average Particle Size Appearance
Boron Powder Nano Boron                ≥99.9% Total Oxygen        ≤100ppm Metal Ion(Fe/Zn/Al/Cu/Mg/Cr/Ni)    /  D50   50~80nm Black powder
Crystal Boron Powder Boron Crystal ≥99% Mg≤3% Fe≤0.12% Al≤1% Ca≤0.08% Si           ≤0.05% Cu               ≤0.001%  -300 mesh Light brown to dark gray powder
Amorphous Element Boron Powder  Boron Non Crystal ≥95% Mg≤3% Water Soluble Boron ≤0.6% Water insoluble Matter ≤0.5% Water and Volatile Mater ≤0.45% Standard size 1 micron, other size is available by request. Light brown to dark gray powder

Package: Aluminum Foil Bag

Stockage: Preservation under sealed drying conditions and store separated from other chemicals.

What are the specific applications of Crystalline Boron?

I. Nuclear Industry
-Serves as a neutron reaction control material in nuclear reactors to regulate neutron velocity and maintain stable reactor operation.
-Leverages the exceptional neutron absorption capacity of crystalline boron to effectively reduce or adjust neutron flux, ensuring the safety of nuclear energy systems.

II. Semiconductor Applications
-P-type Dopant
As a Group III element, crystalline boron introduces acceptor levels in silicon and serves as the core dopant for fabricating P-type semiconductors. Through ion implantation or diffusion processes, precise control of doping concentration enables the formation of P-type wells or substrates in devices including diodes, field-effect transistors (FETs), and insulated-gate bipolar transistors (IGBTs).
-Preparation of P-type Monocrystalline Silicon
During the growth of monocrystalline silicon via the Czochralski (CZ) or Float Zone (FZ) method, trace amounts of high-purity crystalline boron are added to the high-purity polycrystalline silicon melt. Leveraging the segregation effect of boron in silicon, P-type silicon single crystals with controllable resistivity are obtained. Such single crystals act as fundamental substrate materials for discrete devices, analog integrated circuits, and power semiconductor devices.
-Source Material for Boron-doped Silicon Single Crystals
As a pure boron source, crystalline boron can be used to produce silicon single crystals with specified boron concentrations through melt co-doping. Compared with other boron sources (e.g., borane, boron tribromide), crystalline boron offers superior purity stability and doping uniformity, making it suitable for customized substrate requirements in high-performance semiconductor devices such as detectors and high-voltage power chips.
-Purity Requirements
To ensure accurate doping profiles and high device yield, crystalline boron must meet semiconductor-grade purity (typically ≥99.9999%, i.e., 6N or higher). Metal impurities (e.g., Fe, Cu, Na) must be controlled at the ppb level, with strict limits on light-element impurities such as carbon and oxygen. Like N-type dopants including phosphorus, antimony, and arsenic, crystalline boron and its contact environment with silicon must be handled under ultra-clean conditions.

III. Optics
-Utilizes its outstanding nonlinear optical properties to achieve functions including light modulation, frequency sweeping, and frequency doubling.
-Applied in the manufacture of optical devices such as optical modulators, optical frequency combs, and lasers.
-Serves as a gain medium for infrared lasers, featuring a large emission cross-section and a broad excitation spectral range.
IV. High-Hardness Materials
-Used in the production of boron carbide (B₄C), an ultra-hard ceramic material with excellent wear resistance and high-temperature stability, widely used in bulletproof vests, hard tools, abrasives, and wear-resistant ceramics.
-Used in the production of graphite boron compounds (B₉), which have a graphite-like structure, high electrical conductivity, and thermal stability, suitable for high-performance conductive binders, thermal management materials, and friction materials.
V. Military & Aerospace
-High-purity boron ceramic ballistic-resistant materials
-High-purity boron retardants
-High-purity boron welding agents
-High-purity boron explosives
-High-purity boron fuel-rich / oxygen-lean rocket propellants
VI. Alloys & Metallurgy
-High-purity boron-copper alloys
-High-purity boron-titanium alloys
-High-purity boron-doped polycrystalline diamond
-High-purity boron super-hard wear-resistant tools
-High-purity boron corrosion-resistant steel plates
-High-purity boron-nickel alloys
-High-purity boron-chromium alloys
-Lithium-boron alloys (for next-generation battery materials)
-Boron-magnesium superconducting alloys
VII. Surface Coatings (Nanopowder Materials)
-High-purity boron nano-coating powder materials are deposited onto substrate surfaces via sputtering, imparting the following properties to components:
oWear resistance
oCorrosion resistance
oHigh-temperature resistance
oOxidation resistance
oAging resistance
-Meets the extreme operating requirements of aerospace engines and other harsh environments (e.g., optoelectronic, magnetic properties).

 

What are the typical applications of Amorphous Boron?

I. High-Energy Fuels and Propellants
1.Solid Rocket Propellants: Used as a high-energy additive to increase burning rate and specific impulse, suitable for tactical missiles and aerospace booster systems.
2.High-Energy Fuels for Rockets and Missiles: Used in the production of borane compounds (e.g., diborane, decaborane) as key components of liquid or solid high-energy fuels.

II. Nuclear Industry
1.Neutron Absorption Materials: Leveraging the high thermal neutron capture cross-section of Boron-10 (¹⁰B), used in nuclear reactor control rods, emergency shutdown systems, and neutron shielding layers.
2.Neutron Counters: Coated on the inner walls of detectors for thermal neutron detection and energy spectrum analysis.
3.Boron Steel Production: Used as a boron additive to smelt special alloy steels (boron steel) for reactor structural components and neutron shielding parts.

III. Electronic and Electrical Engineering
1.Ignitor Electrodes for Ignitrons: After carbonization at 2300℃, used as cathode materials for ignition cores with low ignition threshold and high ablation resistance.
2.Raw Materials for High-Performance Cathodes: Used to synthesize lanthanum hexaboride (LaB₆), a highly stable, long-life thermionic cathode applied in electron microscopes and high-power microwave tubes.

IV. Metallurgy and Material Processing
1.Special Alloy Steel Smelting: Trace boron addition significantly improves hardenability, high-temperature strength, and neutron irradiation resistance of steel.
2.Gas Scavenger for Molten Copper: Removes oxygen and other dissolved gases from molten copper to enhance conductivity and density.
3.Boron Fiber Reinforced Materials: Used as the core raw material for boron fibers in aerospace composites and high-performance sports equipment.

V. Catalysts and Chemical Synthesis
1.Organic Synthesis Catalysts: Used in selective hydrogenation, dehydrogenation, and rearrangement reactions to improve yield and selectivity.
2.Ceramic Industry Catalysts: Promote low-temperature sintering and densification of boride ceramics (e.g., TiB₂, ZrB₂).
3.Synthesis of High-Purity Boron Compounds: Used as a boron source to produce high-purity boric acid, sodium borohydride, boron nitride, and other fine chemicals.
4.Preparation of High-Purity Boron Halides: Used to synthesize high-purity BBr₃, BCl₃, etc., as semiconductor diffusion sources and optical fiber dopants.

VI. Automotive Safety Systems
-Airbag Initiators: Used as a component of gas-generating agents; upon collision, it burns rapidly to produce high-pressure nitrogen and inflate the airbag.

VII. Fireworks and Pyrotechnics Industry
-Pyrotechnic Effects Agents: Produces green flames and bright sparks when burned, used in fireworks, signal flares, and military illuminating projectiles.

VIII. Pharmaceutical and Biological Fields
-Pharmaceutical Intermediates: Used in the synthesis of boron-containing drugs (e.g., boronophenylalanine) for Boron Neutron Capture Therapy (BNCT), or as doping sources for antibacterial materials.


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