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Trimethylaluminum (TMA, Al(CH3)3) is a classic aluminium-source precursor for Atomic-Layer Deposition (ALD) and Chemical-Vapour Deposition (CVD). It is widely used for high-k dielectric layers (e.g. Al2O3), gate-oxide films and semiconductor-device passivation layers. Key selection criteria for high-purity metal-organic TMA cover ppb-level metallic impurities, vapour-pressure stability and batch-to-batch consistency. We supply TMA at ≥ 99.9999 % (6N) purity, supported by full TDS documentation, ICP-MS metallic-impurity analysis and SDS safety datasheets. Given TMA’s extreme sensitivity to moisture and air, custom packaging including bubbler cylinders and stainless-steel vessels is available alongside export-compliant paperwork, helping semiconductor and photovoltaic customers accelerate material qualification.
  • Trimethylaluminum(TMAI)

    Trimethylaluminum(TMAI)

    Trimethylaluminum (TMAI) is a critical raw material for the production of other metal-organic sources utilized in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes.

    Trimethylaluminum represents one of the simplest organoaluminum compounds. Although its name suggests a monomeric structure, it actually has the formula Al2(CH3)6 (abbreviated as Al2Me6 or TMAI), existing as a dimer. This colorless liquid is pyrophoric and plays an industrially significant role, closely related to triethylaluminum.

    UrbanMines ranks among the leading suppliers of Trimethylaluminum (TMAI) in China. Leveraging our advanced production techniques, we offer TMAI with varying levels of purity, tailored specifically for applications in the semiconductor, solar cell, and LED industries.

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