Qhov loj ntawm kev ua lag luam thiab lub peev xwm tsim khoom ntawm cov khoom siv hluav taws xob hafnium tetrachloride hauv Suav teb pheej nthuav dav.
Chaw Tshawb Fawb Txog Kev Lag Luam Xav Tshiab Hauv Suav Teb tau tso tawm rau lub Peb Hlis 5, 2026
Qib hluav taws xob hafnium tetrachloride yog hais txog kev ntshiab hafnium tetrachloride nrog kev ntshiab ntawm 99.95% lossis siab dua.
Hafnium tetrachloride, nrog rau cov mis molecularHfCl4thiab qhov hnyav molecular ntawm 320.302, yog hmoov dawb crystalline. Nws yog corrosive thiab tuaj yeem hlawv lub qhov muag thiab daim tawv nqaij. Nws kuj tseem ua rau lub cev ua pa tsis zoo. Nws muaj qhov melting point ntawm 320 ° C thiab tuaj yeem sublimate. Nws yooj yim soluble hauv cov organic solvents xws li methanol thiab acetone. Nws reacts nrog dej kom tso tawm cov pa lom. Nws yog hygroscopic thiab decomposes yooj yim thaum raug rau huab cua thiab yuav tsum tau khaws cia rau hauv lub thawv kaw.
"2025 Tuam Tshoj Qib Hluav Taws Xob Hafnium Tetrachloride Kev Lag Luam Tshwj Xeeb Kev Tshawb Fawb thiab Kev Lag Luam '15th Tsib-Xyoo Txoj Kev Npaj' Daim Ntawv Qhia Tswv Yim" tso tawm los ntawm Chaw Tshawb Fawb Kev Xav Tshiab, qib hluav taws xob hafnium tetrachloride feem ntau yog siv hauv kev lag luam semiconductor ua cov khoom siv semiconductor precursor. Nws tau tso thiab loj hlob ua cov yeeb yaj kiab nyias nyias raws li hafnium siv cov txheej txheem xws li atomic layer deposition (ALD) thiab chemical vapor deposition (CVD). Cov yeeb yaj kiab nyias nyias raws li Hafnium muaj qhov dielectric siab, ua rau lawv yog ib qho ntawm cov ntaub ntawv tseem ceeb rau kev tsim cov txheej txheem dielectric ntawm cov tiam tom ntej me me, kev ua haujlwm siab transistors. Qib hluav taws xob hafnium tetrachloride tuaj yeem ua tau raws li kev txhim kho ntawm kev tsim cov txheej txheem tsim khoom chip txuas ntxiv mus, thiab nws qhov chaw ua lag luam txuas ntxiv nthuav dav. Tsis tas li ntawd, vim nws cov khoom siv optical zoo heev, cov khoom siv kho tshuab, thiab kev ruaj khov thermal, qib hluav taws xob hafnium tetrachloride kuj tseem siv tau hauv kev tsim cov yeeb yaj kiab nyias nyias optical, high-power LEDs, ze-infrared optoelectronic devices, thiab ultra-high temperature ceramics.
Qhov zoo ntawm cov thev naus laus zis purification cuam tshuam ncaj qha rau qhov purity thiab qib ntawm hluav taws xob-qib hafnium tetrachloride. Nyob rau hauv xyoo tas los no, tus naj npawb ntawm patents ntsig txog cov txheej txheem purification thiab cov khoom siv tsim khoom ntawm hluav taws xob-qib hafnium tetrachloride hauv Suav teb tau nce ntxiv, suav nrog "ib lub cuab yeej rau kev npaj hluav taws xob-qib hafnium tetrachloride" thiab "ib txoj kev rau kev ntxuav hluav taws xob-qib hafnium tetrachloride".
Thaum lub Tsib Hlis 2025, tau tshaj tawm txog kev tso cai patent rau "ib txoj kev ntxuav rau cov khoom siv hluav taws xob hafnium tetrachloride". Nyob rau hauv kev tiv thaiv ntawm cov roj inert, cov hafnium tetrachloride nyoos raug muab tso rau hauv lub nkoj quartz, thiab los ntawm cov txheej txheem xws li nqus tsev, cua sov, sublimation purification, thiab txias sau, cov khoom siv hluav taws xob hafnium tetrachloride nrog qhov huv ntawm 5N thiab 6N tuaj yeem tau txais.
Hauv kev ua lag luam Suav teb,UrbanMines Tech.Limited feem ntau yog tshawb nrhiav, tsim kho, thiab muab cov khoom siv hluav taws xob hafnium tetrachloride nrog cov purities ntawm ≥99.9%, 99.95%, thiab ≥99.99%.
Cov kws tshuaj ntsuam kev lag luam ntawm Newthink, Tuam Tshoj lub peev xwm tsim khoom hafnium tetrachloride hauv hluav taws xob tseem tab tom nthuav dav. Thaum lub Tsib Hlis 2025, Tuam Tshoj Lub Chaw Tiv Thaiv Ib Puag Ncig Hauv Tebchaws tau tshaj tawm tias daim ntawv qhia txog kev cuam tshuam ib puag ncig rau "Semiconductor New Materials Pilot Plant Project" yuav raug pom zoo thiab tshaj tawm, thiab qee lub tuam txhab ua lag luam hauv kev lag luam kuj tseem tab tom nthuav dav mus rau hauv kev lag luam hafnium tetrachloride hauv hluav taws xob.